Sputtering onto liquids: a critical review

• Anastasiya Sergievskaya,
• Adrien Chauvin and
• Stephanos Konstantinidis

Beilstein J. Nanotechnol. 2022, 13, 10–53, doi:10.3762/bjnano.13.2

• discharge types, one can dramatically increase the plasma electron density. As a result, in such high-power impulse magnetron sputtering (HiPIMS) discharges, the ionization degree of the sputtered metal atoms is significantly increased. Typically, under these conditions, the sputtered species have a higher

Oblique angle deposition of nickel thin films by high-power impulse magnetron sputtering

• Hamidreza Hajihoseini,
• Movaffaq Kateb,
• Snorri Þorgeir Ingvarsson and
• Jon Tomas Gudmundsson

Beilstein J. Nanotechnol. 2019, 10, 1914–1921, doi:10.3762/bjnano.10.186

• -100 44, Stockholm, Sweden 10.3762/bjnano.10.186 Abstract Background: Oblique angle deposition is known for yielding the growth of columnar grains that are tilted in the direction of the deposition flux. Using this technique combined with high-power impulse magnetron sputtering (HiPIMS) can induce

• properties for some important technological applications in addition to the ability to fill high aspect ratio trenches and coating on cutting tools with complex geometries. Keywords: glancing angle deposition (GLAD); high-power impulse magnetron sputtering (HiPIMS); oblique angle deposition; magnetron

• ][21] and substrate temperature [19], as well as while stacking into superlattices [23][24]. High-power impulse magnetron sputtering (HiPIMS), sometimes referred to as high-power pulsed magnetron sputtering (HPPMS), is a physical vapor deposition (PVD) technique based on pulsed power technology where

Fabrication and characterization of Si_1−xGe_x nanocrystals in as-grown and annealed structures: a comparative study

• Muhammad Taha Sultan,
• Adrian Valentin Maraloiu,
• Ionel Stavarache,
• Jón Tómas Gudmundsson,
• Andrei Manolescu,
• Valentin Serban Teodorescu,
• Magdalena Lidia Ciurea and
• Halldór Gudfinnur Svavarsson

Beilstein J. Nanotechnol. 2019, 10, 1873–1882, doi:10.3762/bjnano.10.182

• consequential interface characteristics and its effect on the photocurrent spectra. Keywords: grazing incidence XRD (GIXRD); high-power impulse magnetron sputtering (HiPIMS); HRTEM; magnetron sputtering; photocurrent spectra; SiGe nanocrystals in SiO2/SiGe/SiO2 multilayers; STEM-HAADF; TEM; Introduction

• annealing. A rather recent variation of the magnetron sputtering technique, the so-called high-power impulse magnetron sputtering (HiPIMS), provides an alternative approach. It is an ionized physical vapor deposition method and has shown great promise in thin-film processing [25][26]. During HiPIMS the

• impulse magnetron sputtering (HiPIMS). The as-grown structures subsequently underwent rapid thermal annealing (550–900 °C for 1 min) in N2 ambient atmosphere. The structures were investigated using X-ray diffraction, high-resolution transmission electron microscopy together with spectral photocurrent